Positive photoresist composition

Details Positive photoresist composition Positive photoresist composition

G - Physics

03

F

G03F 7/23 (2006.01) G03F 7/023 (2006.01)

Patent

CA 2118192

ABSTRACT OF THE DISCLOSURE A positive photoresist composition excellent in properties such as resolution, profile, etc. and good in sensitivity, which comprises a novolac resin obtained through a condensation reaction of a mixed cresol compo- nent consisting of m-cresol and p-cresol, a mixed xylenol component consisting of 3,5-xylenol and xylenols other than 3,5-xylenol and an aldehyde compound, a 1,2- quinonediazide compound and an alkali-soluble compound of which molecular weight is lower than 900, wherein, in said condensation reaction, the ratio a of the mixed xylenol based on the sum of the mixed cresol and the mixed xylenol is not smaller than 10% by mol and not greater than 25% by mol and the ratio .beta. of 3,5-xylenol in the mixed xylenol is not smaller than 20% by mol and not greater than 60% by mol.

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