Positive photoresist compositions

Details Positive photoresist compositions Positive photoresist compositions

G - Physics

03

F

96/165

G03F 7/016 (2006.01) G03F 7/022 (2006.01) G03F 7/16 (2006.01)

Patent

CA 1273522

20731-904 ABSTRACT OF THE DISCLOSURE Disclosed is a positive-working radiation-sensitive coating solution containing a polymeric binder which is insoluble in water and soluble in aqueous-alkaline solutions, a radiation-sensitive compound and an organic solvent or mixture of solvents with a propylene glycol alkyl ether acetate. The solution has an improved photospeed and is less injurious to health. Hoe 84/K 100

483297

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