Positive photoresist developer containing development modifiers

Details Positive photoresist developer containing development modifiers Positive photoresist developer containing development modifiers

G - Physics

03

F

96/60

G03F 7/32 (2006.01)

Patent

CA 1254429

ABSTRACT OF THE DISCLOSURE A developer for positive photoresists which can improve the sensitivity and resolution of the resist is disclosed. The developer comprises an aqueous solution of a quaternary ammonium hydroxide represented by the formula Image (I) wherein R1, R2, R3, and R4 are each an alkyl group having 1 to 4 carbon atoms or a hydroxyalkyl group having 1 to 5 carbon atoms, and at least one development modifier selected from the group consisting of water-soluble aliphatic ketones, cyclic ethers, and tertiary amines, and optionally, at least one another development modifier selected from the group consisting of water-soluble primary amines and secondary amines.

450923

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