Positive photoresist systems

Details Positive photoresist systems Positive photoresist systems

G - Physics

03

F

96/174

G03F 7/09 (2006.01) G03F 7/004 (2006.01) G03F 7/023 (2006.01)

Patent

CA 1228498

- i - PATENT APPLICATION of ROBERT DAVID GLEIM and MARK PETER de GRANDPRE for POSITIVE PHOTORESISTS CONTAINING PREFORMED POLYGLUTARIMIDE POLYMER DN 82-63 MSA:plb ABSTRACT OF DISCLOSURE This invention relates to a positive photoresist system possessing a high degree of thermal stability. The photoresist system contains a preformed polyglutarimide polymer dissolved in a non-reacting solvent. The positive resist is capable of achieving high resolution images by exposure to a wide range of wavelengths and development using an aqueous base developer. The photoresist system is also suitable for use as a planarizing layer in a multiple layer system.

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