Positive photoresists of the polyimide type

Details Positive photoresists of the polyimide type Positive photoresists of the polyimide type

G - Physics

03

F

96/177

G03F 7/023 (2006.01)

Patent

CA 2002149

K-17324/=/MER 21 Positive photoresists of the polyimide type Abstract of the Disclosure The invention relates to positive working photoresists for producing relief structures of high-temperature resistant polyimide prepolymers, which photoresists can be developed in aqueous-alkaline medium and which contain, in an organic solvent, essentially at least a) one prepolymer which is convertible into a polyimide, b) one radiation-sensitive quinonediazide compound, and further optional components, said prepolymer being a completely esterified polyamic acid polymer.

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