Positive photoresists with increased heat stability

Details Positive photoresists with increased heat stability Positive photoresists with increased heat stability

G - Physics

03

F

96/165

G03F 7/022 (2006.01)

Patent

CA 2000924

K-17322/=/MER 19 Positive photoresists with increased heat stability Abstract of the Disclosure The invention relates to positive photoresists based on alkali-soluble phenolic resin and photosensitive quinone- diazide compounds which, by means of particular additives, give relief structures produced therewith an increased stability towards changes due to thermal effects.

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