Positive resist composition

Details Positive resist composition Positive resist composition

G - Physics

03

F

G03F 7/008 (2006.01) C08G 8/20 (2006.01) G03F 7/023 (2006.01)

Patent

CA 2042788

- 14 - ABSTRACT OF THE DISCLOSURE A positive resist composition comprising a radiation-sensitive compound and an alkali-soluble resin which is obtainable by a condensation reaction of na alde- hyde and a specific hydroxyl group-containing compound can improve heat resistance without deterioration of sensitivity and film thickness retention.

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