Positive resist composition

Details Positive resist composition Positive resist composition

G - Physics

03

F

G03F 7/008 (2006.01) G03F 7/022 (2006.01)

Patent

CA 2042807

ABSTRACT OF THE DISCLOSURE A positive resist composition comprising an alkali-soluble resin, a quinone diazide compound and a spe- cific hydroxyl group-containing compound can improve sensi- tivity without deterioration of heat resistance and film thickness retention.

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