Positive resist composition

Details Positive resist composition Positive resist composition

G - Physics

03

F

G03F 7/016 (2006.01) G03F 7/022 (2006.01) G03F 7/038 (2006.01)

Patent

CA 2062399

- 15 - ABSTRACT OF THE DISCLOSURE A positive resist composition which contains, in admixture, an alkali-soluble resin and at least one quinone diazide sulfonate of a phenol compound of the formula: Image (I) in which R1 and R2 are independently an alkyl group, an alkoxy group, a carboxyl group or a halogen atom; R3 is a hydrogen atom, an alkyl group, an alkoxy group, a carboxyl group or a halogen atom; R4 is a hydrogen atom, an alkyl group or an aryl group; and w, x, y and z are independently 0, 1, 2 or 3, provided that the sum of w and x is at least 1 or a phenol compound of the formula: Image (II) in which R5 is an alkyl group, an alkoxy group, a carboxyl group or a halogen atom; R6 is a hydrogen atom, an alkyl group, an alkoxy group, a carboxyl group or a halogen atom; - 16 - R7 is a hydrogen atom, an alkyl group or an aryl group; and e, f, g and h are independently 0, 1, 2 or 3, which composi- tion has a high .gamma.-value and a high film thickness retention.

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