Positive resist composition

Details Positive resist composition Positive resist composition

G - Physics

03

F

G03F 7/022 (2006.01) G03F 7/004 (2006.01) G03F 7/038 (2006.01)

Patent

CA 2067041

- 15 - ABSTRACT OF THE DISCLOSURE A positive resist composition containing, in admixture, an alkali-soluble resin, a quinone diazide com- pound and a mixed solvent of ethyl lactate and at least one solvent selected from the group consisting of (a) n-amyl acetate and (b) 2-heptanone in a weight ratio of 5:95 to 80:20, which composition has a good coating properties and provides an improved profile and a large depth of focus.

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