Positive resist composition

Details Positive resist composition Positive resist composition

G - Physics

03

F

G03F 7/039 (2006.01) G03F 7/022 (2006.01)

Patent

CA 2096214

ABSTRACT OF THE DISCLOSURE A positive resist composition comprising an alkali-soluble resin and a light-sensitive quinonedi- azide material containing a quinonediazidesulfonic acid ester of at least one phenol compound represented by the following general formulas: Image (Ia), Image (Ib), Image (Ic), Image (Id) wherein R1 represents hydrogen, halogen, or the like; R3 represents alkyl or phenyl; x represents 1-3; Q1 to Q12 represent hydrogen, alkyl or phenyl; and Z1 to Z5 represent the groups of the following formulas: Image , Image , Image or Image wherein R2 is hydrogen, halogen or the like; R3 is as defined above; y is 1-3; and p is 0 or 1. This positive resist composition is excellent in the balance between properties such as resolution, profile, depth of focus, etc.

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