Positive resist composition

Details Positive resist composition Positive resist composition

G - Physics

03

F

G03F 7/039 (2006.01) G03F 7/022 (2006.01)

Patent

CA 2095107

ABSTRACT OF THE DISCLOSURE A positive resist composition comprising an alkali-soluble resin and a light-sensitive quinone- diazide material containing a quinonediazidesulfonic acid diester of at least one member selected from the phenol compounds represented by the following general formulas: Image (I) Image (II) wherein R1 and R2 each represent hydrogen, halogen, -OCOR3 , alkyl or alkoxy in which R3 represents alkyl or phenyl, x and y each represent 1, 2 or 3, and R, R0, R' and R0' each represent hydrogen atom, alkyl or phenyl group; wherein the content of said diester is 50% or greater based on the total light-sensitive quinone- diazide material. This composition is excellent in the balance between properties such as resolution, profile and depth of focus.

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