Positive resist composition

Details Positive resist composition Positive resist composition

G - Physics

03

F

G03F 7/16 (2006.01) C08G 8/24 (2006.01) G03F 7/023 (2006.01) G03F 7/039 (2006.01)

Patent

CA 2085962

- 36 - ABSTRACT OF THE DISCLOSURE A positive resist composition containing a quinone diazide compound and an alkali-soluble resin which contains a resin (A) obtained by a condensation reaction of an alde- hyde compound, at least one phenol compound of the formula: Image (I) wherein R1, R2 and R3 are independently a hydrogen atom, or a C1-C4 alkyl or alkoxy group, and j is 1 or 2, and at least one compound of the formula: Image (II) wherein R'1, R'2, R'3, R'4, R'5 and R'6 are independently a hydrogen atom, or a C1-C4 alkyl or alkoxy group, R'7 is a hydrogen, a C1-C4 alkyl group or an aryl group, and k, m and n are independently 0, 1 or 2 provided that a sum of k, m and n is larger than 2, which composition is excellent in balance among various properties such as a profile, a sensi- tivity, heat resistance and a depth of focus.

Affiliated with

Also associated with

Rating

Positive resist composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive resist composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive resist composition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1527898