Positive resist composition

Details Positive resist composition Positive resist composition

G - Physics

03

F

G03F 7/022 (2006.01)

Patent

CA 2044165

- 13 - ABSTRACT OF THE DISCLOSURE A positive resist composition which comprises an alkali-soluble resin and, as a sensitizer, a quinone diazide sulfonic acid ester of a phenol compound of the formula: Image ( I ) wherein Y1, Y2, Z1, Z2, Z3, Z4, Z5, Z6 and Z7 are indepen- dently a hydrogen atom, a hydroxyl group, a C1-C4 alkyl group which may be substituted with a halogen atom, provided that at least one of Y1 and Y2 is a hydroxyl group, and at least two of Z1 to Z7 are hydroxyl groups, and R1, R2, R3, R4, R5 and R6 are independently a hydrogen atom, a C1-C10 alkyl group, a C1-C4 alkenyl group, a cycloalkyl group or an aryl group, which composition has a high y-value.

Affiliated with

Also associated with

Rating

Positive resist composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive resist composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive resist composition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1564833