Positive resist composition

Details Positive resist composition Positive resist composition

G - Physics

03

F

G03F 7/039 (2006.01) G03F 7/023 (2006.01)

Patent

CA 2096317

ABSTRACT OF THE DISCLOSURE A positive resist composition comprising a quinonediazide compound and an alkali-soluble resin containing resin (A) obtainable through a condensation reaction of at least one compound represented by the general formula (I): Image (I) wherein R1, R2 and R3 independently of one another each represent a hydrogen atom or an alkyl or alkoxy group having 1-4 carbon atoms and k represents 1 or 2, at least one polyphenol compound represented by the general formula (II): Image (II) wherein R4' to R6' each represent a hydrogen atom or an alkyl or alkoxy group and n represents 1 or 2, with an aldehyde compound. This positive resist composition is excellent in properties such as profile, resolution, heat resistance, etc.

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