Positive resist composition

Details Positive resist composition Positive resist composition

G - Physics

03

F

G03F 7/039 (2006.01) G03F 7/022 (2006.01)

Patent

CA 2076357

- 18 - ABSTRACT OF THE DISCLOSURE A positive resist composition comprising an alkali-soluble resin containing a novolak resin which is obtained by a condensation reaction of a phenol compound and a carbonyl compound and has an area in a GPC pattern of a range in that a molecular weight as converted to polystyrene is not larger than 900 not exceeding 20 % of a whole pattern area excluding the unreacted phenol compound, a quinone- diazide compound and a polyphenol compound of the formula: Image (I) in which R1 and R2 are independently a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group or a group: -OCOR3 in which R3 is an alkyl group or a phenyl group, x and y are independently an integer of 1 to 3, and m is an integer of 0 to 4, wherein a weight ratio of said polyphenol compound (I) to said alkali-soluble resin is from 3:10 to 5:10, which is excellent in heat resistance, sensitivity, resolution and a depth of focus and leaves no scum after development.

Affiliated with

Also associated with

Rating

Positive resist composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive resist composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive resist composition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1764730