G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/022 (2006.01) G03F 7/004 (2006.01) G03F 7/038 (2006.01)
Patent
CA 2067042
- 21 - ABSTRACT OF THE DISCLOSURE A positive resist composition comprising, in admixture, an alkali-soluble resin, a quinone diazide com- pound and a mixed solvent of (B) at least one organic sol- vent selected from the group consisting of .gamma.-butyrolactone, 3-methoxybutanol and cyclohexanone and (A) an organic sol- vent which does not have simultaneously an alkylcarbonyl group and an alkoxy group in a molecule and has a boiling point of from 140 to 180°C under atmospheric pressure except the solvents (B),-which composition has a large .gamma.-value and provides an improved profile and a large depth of focus.
Doi Yasunori
Hanawa Ryotaro
Hashimoto Kazuhiko
Osaki Haruyoshi
Uetani Yasunori
Kirby Eades Gale Baker
Sumitomo Chemical Co. Ltd.
LandOfFree
Positive resist composition does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Positive resist composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive resist composition will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1895350