C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
96/172, 96/266,
C08F 20/52 (2006.01) C08F 8/32 (2006.01) G03F 7/039 (2006.01)
Patent
CA 1072243
POSITIVE RESISTS CONTAINING DIMETHYLGLUTARIMIDE UNITS Abstract of the Disclosure A process for forming an image with a positive resist using a polymer containing dimethylglutarimide units. The polymer is sensitive to both electron beam and light radiation, has a high glass transition temperature, a high temperature resistance, and is capable of very fine spatial resolution, very suitable for micro circuitry processings.
261430
Bargon Joachim
Gipstein Edward
Hiraoka Hiroyuki
International Business Machines Corporation
Na
LandOfFree
Positive resists containing dimethylglutarimide units does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Positive resists containing dimethylglutarimide units, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive resists containing dimethylglutarimide units will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1128246