Positive type photo-sensitive resinous composition

Details Positive type photo-sensitive resinous composition Positive type photo-sensitive resinous composition

G - Physics

03

F

96/165

G03F 7/023 (2006.01) G03F 7/022 (2006.01)

Patent

CA 1330404

Abstract The invention provides a photosensitive resin composition specifically useful for microfabrication resist films and photosensitive materials for use in lithographic plates because of excellent flexibility and adhesion, and moreover, when developed, non-exposed parts being of extremely less swelling nature.

576099

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