Positive-type photosensitive electrodeposition coating...

G - Physics – 03 – F

Patent

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96/158, 345/28

G03F 7/022 (2006.01) C08F 120/06 (2006.01) G03F 7/023 (2006.01) G03F 7/16 (2006.01)

Patent

CA 2009831

Abstract of the Disclosure A positive-type photosensitive electrodeposi- tion coating composition comprising (A) a photosensitive compound having a molecular weight of less than 6,000 and containing at least one modified quinonediazidesulfone units represented by the following formula (I) (I) Image wherein R1 represents Image or Image , R2 represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkyl ether group, and R3 represents an alkylene group, a cyclo- alkylene group or an alkylene ether group, in the molecule and (B) an acrylic resin having a salt forming group.

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