G - Physics – 03 – F
Patent
G - Physics
03
F
96/158
G03F 7/016 (2006.01) C08F 220/02 (2006.01) G03F 7/023 (2006.01) G03F 7/027 (2006.01)
Patent
CA 2024482
Abstract of the disclosure A positive type photosensitive resinous composition comprising a binder resin and a quinone diazide compound, the binder resin being a copolymer of (a) at least one phosphoric acid ester monomer represented by the formula: Image (b) at least one acid group containing .alpha.,.beta.-ethylenically unsaturated monomer, and (c) other copolymerizable .alpha.,.beta.-ethylenically unsaturated monomers than (a) and (b), which is specifically useful for the formation of resist coating in the preparation of printed circuit board.
Ikeda Takeshi
Sakurai Kiyomi
Seio Mamoru
Ikeda Takeshi
Marks & Clerk
Nippon Paint Co. Ltd.
Sakurai Kiyomi
Seio Mamoru
LandOfFree
Positive type photosensitive resinous composition does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Positive type photosensitive resinous composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive type photosensitive resinous composition will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1394288