Positive type photosensitive resinous composition

G - Physics – 03 – F

Patent

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96/158

G03F 7/016 (2006.01) C08F 220/02 (2006.01) G03F 7/023 (2006.01) G03F 7/027 (2006.01)

Patent

CA 2024482

Abstract of the disclosure A positive type photosensitive resinous composition comprising a binder resin and a quinone diazide compound, the binder resin being a copolymer of (a) at least one phosphoric acid ester monomer represented by the formula: Image (b) at least one acid group containing .alpha.,.beta.-ethylenically unsaturated monomer, and (c) other copolymerizable .alpha.,.beta.-ethylenically unsaturated monomers than (a) and (b), which is specifically useful for the formation of resist coating in the preparation of printed circuit board.

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