Positive type radiation-sensitive resist composition

Details Positive type radiation-sensitive resist composition Positive type radiation-sensitive resist composition

G - Physics

03

F

G03F 7/038 (2006.01) G03F 7/022 (2006.01)

Patent

CA 2078830

ABSTRACT OF THE DISCLOSURE A positive type radiation-sensitive resist composition comprising an alkali-soluble resin, a radiation-sensitive ingredient and a phenol compound represented by general formula (I): (I) Image wherein R1, R2 and R3 independently of one another each represent a hydrogen atom, an alkyl group or an alkoxy group and n represents 1, 2 or 3. This composition is a positive type radiation-sensitive resist composition excellent in the balance between performances including resolution, sensitivity and heat resistance.

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