G - Physics – 03 – C
Patent
G - Physics
03
C
96/150
G03C 1/72 (2006.01) C08G 16/02 (2006.01) C08G 16/04 (2006.01) C08G 61/12 (2006.01) G03F 7/039 (2006.01)
Patent
CA 1241860
ABSTRACT OF THE DISCLOSURE Disclosed are novel photosensitive compositions containing a polycondensation product of a compound of the general formula R-M-R which product contains terminal substituent functional groups containing an ethylenically unsaturated moiety, and a photosensitizing effective amount of a free radical generating photoinitiator. Through the selected exposure of films and coatings prepared from the above composition, it is possible to record information in such materials in a manner as to alter the physical and/or chemical properties of such films and coatings. This selective modification can then be simply manifested by contacting the exposed surface of the film or coating, sub- sequent to such exposure, with an alkaline developing solution. These compositions are useful in the graphic arts and in the manufacture of printed circuit boards for the electronics industry.
436281
Duyal Tulay
Walls John E.
Fetherstonhaugh & Co.
Hoechst Celanese Corporation
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