Positive working photosensitive film resist material...

Details Positive working photosensitive film resist material... Positive working photosensitive film resist material...

G - Physics

03

F

96/172

G03F 7/16 (2006.01) G03F 7/039 (2006.01)

Patent

CA 1147195

O.Z. 0050/033896 ABSTRACT OF THE DISCLOSURE: A positive working photosensi- tive film resist material suitable for multiple image-wise exposure comprises, on a dimensionally stable base film, a photosensitive coating which contains (a) a polymer which possesses aromatic or hetero-aromatic o-nitrocarbinol ester groups (for example o-nitrobenzyl acrylate units) and which can be washed out, after exposure, with an alkaline solvent, and (b) a transparent plasticizer compatible with (a). The product may be used as photopolymer dry film resist material in the production of electrical conductor boards, chemically milled fine-line parts, and identification plates.

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