G - Physics – 03 – C
Patent
G - Physics
03
C
G03C 1/73 (2006.01) G03F 7/004 (2006.01) G03F 7/038 (2006.01) G03F 7/30 (2006.01)
Patent
CA 2066148
Abstract of the Disclosure A positive-working, radiation-sensitive mixture containing a) a compound which generates a strong acid under the action of actinic radiation, b) a compound having at least one C-O-C or C-O-Si bond cleavable by acid and c) a polymeric binder which is insoluble in water and soluble or at least swellable in aqueous alkaline solutions, wherein the compound (a) is a 1,3,5- or 1,2,4-tri- hydroxybenzene or a 1,2,3-, 1,3,5- or 1,2,4-trihydroxy- benzene substituted on the aromatic ring by a radical R'; or a polymer containing a dihydroxy-phenoxy radical or a polymer containing a trihydxoxy phenylene radical; wherein the hydroxybenzene or hydroxy-containing polymer is partially or fully esterified with sulfonic acids of the formula R-SO3H, is distinguished by high resolution and high sensitivity over a wide spectral range. It also shows high thermal stability and does not form any corrosive photolysis products on exposure. A radiation- sensitive recording material which has been produced with mixture is suitable for the production of photoresists, electronic components, printing plates, or for chemical milling.
Eckes Charlotte
Fuchs Juergen
Pawlowski Georg
Roeschert Horst
Spiess Walter
Eckes Charlotte
Fetherstonhaugh & Co.
Fuchs Juergen
Hoechst Aktiengesellschaft
Pawlowski Georg
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