G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/039 (2006.01)
Patent
CA 2080364
2080364 9115809 PCTABS00007 This invention relates to positive working resist compositions having utility in dry film photoresists and to fully aqueous methods for developing and stripping them.
Bauer Richard Douglas
Chen Gwendyline Yuan Yu
Hertler Walter Raymond
Wheland Robert Clayton
E.i. Du Pont de Nemours And Company
Sim & Mcburney
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