Post-exposure treatment of a relief printing plate with a...

Details Post-exposure treatment of a relief printing plate with a... Post-exposure treatment of a relief printing plate with a...

G - Physics

03

F

96/251, 96/69

G03F 7/20 (2006.01)

Patent

CA 1177684

Abstract of the Disclosure Disclosed is the improvement in post-exposing relief printying plates preparaed from photosentsitive polymeric com- positions which comprises immersing the relief printing plate in a dilute aqueous solution of a persulfate salt and a sur- ficient amount of a water-solution carboxylic acid to provide a pH of about 1.5 to about 2.5 during exposure to actinic radiation.

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