Pour point depressants for paraffin solutions

C - Chemistry – Metallurgy – 09 – K

Patent

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31/66, 196/69

C09K 3/00 (2006.01) C09K 8/524 (2006.01) C10L 1/236 (2006.01)

Patent

CA 1216150

ABSTRACT OF THE DISCLOSURE An ester/amide copolymer useful as a pour-point depressant, wherein: the ester comonomer is at least one acrylic acid or methacrylic acid--C16-24 aliphatic alcohol ester; the amide comonomer is at least one acrylamide or methacrylamide, unsubstituted or substi- tuted at the nitrogen atom; and the mol ratio of ester to amide is about 2-10:1.

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