Pre-exposure method for increased sensitivity in high...

Details Pre-exposure method for increased sensitivity in high... Pre-exposure method for increased sensitivity in high...

G - Physics

03

F

96/251

G03F 7/26 (2006.01) G03F 7/20 (2006.01)

Patent

CA 1285418

PRE-EXPOSURE METHOD FOR INCREASED SENSITIVITY IS HIGH CONTRAST RESIST DEVELOPMENT ABSTRACT OF THE INVENTION A high contrast developing process is described for use after pre-exposure to UV-visible radiation to produce increased sensitivity during lithographic pro- cessing of positive resist layers. Compared to samples which have not been subjected to the methods of this invention, sensitivity increases of a factor of 2-4 are to be expected. An additional benefit of low film loss from unexposed resist is obtained. The system disclosed is applicable to lithographic exposures utilizing electrons, photons (eg. UV-visible, x-rays, etc.) and atomic or molecular charged particles. Specifically, as a result of the increased sensitivity, higher throughput during lithographic processing for the fabrication of photomasks and semiconductor devices is realized.

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