C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 295/04 (2006.01) A01N 33/12 (2006.01) A01N 43/34 (2006.01) A01N 43/36 (2006.01) A01N 43/40 (2006.01) A01N 43/46 (2006.01) A01N 43/50 (2006.01) A01N 43/72 (2006.01) A01N 43/78 (2006.01) A01N 43/84 (2006.01) C07D 211/14 (2006.01) C07D 211/70 (2006.01) C07D 233/56 (2006.01) C07D 265/30 (2006.01) C07D 277/04 (2006.01) C07D 295/067 (2006.01) C07D 295/088 (2006.01) C07D 295/15 (2006.01) C07D 521/00 (2006.01)
Patent
CA 2080541
ABSTRACT OF THE DISCLOSURE Antimicrobial compounds of the formula Image (I) wherein R is selected from (C1 to C20) straight or branched alkyl, optionally substituted with hydroxy, halogen, alkoxy, phenoxy, or -C(=O)R wherein R' is selected from (C1-C20)alkyl, (C1-C20)alkoxy, phenox phenyl; benzyl; phenethyl; cyanoethyl; 2-cyanoethyl; propargyl; and allyl; X = halogen (chlorine, bromine, or iodine), phosphate, acetate, benzoate, citrate, tartrate, alkyl- or aryl-sulfonate, alkylsulfate; and Image represents a 3- to 7-membered ring that contains at least one nitrogen atom or addition to said one nitrogen atom, selected from sulfur, oxygen, and a second nitrogen; are disclosed. Processes for inhibiting microbial growth, and compositions suitable therefore are also disclosed.
Gowling Lafleur Henderson Llp
Rohm And Haas Company
LandOfFree
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