C - Chemistry – Metallurgy – 07 – K
Patent
C - Chemistry, Metallurgy
07
K
C07K 5/06 (2006.01) A01N 37/44 (2006.01) A01N 37/46 (2006.01) A01N 47/10 (2006.01) A01N 47/12 (2006.01) C07C 229/02 (2006.01) C07C 229/08 (2006.01) C07C 233/49 (2006.01) C07C 271/22 (2006.01) C07C 323/58 (2006.01)
Patent
CA 2023176
ABSTRACT OF THE DISCLOSURE Antimicrobial compounds of the formula Image (I) wherein R1 is selected from the group consisting of H, an amine protective group, and a moiety of the formula Image (II) wherein R2, R5, and R6 are independently selected from H and an amine protective group; R3 and R4 are independently selected from H, lower alkyl, aryl, arylalkyl, CH2OR, CH2SR or CH(CH3)OR; R = H, lower alkyl, arylalkyl or aryl; wherein R1 and R2 or R5 and R6 can be joined to form a ring; and wherein when R1 and R2 or R5 and R6 are both H, the compound is either in free base form or in salt form.
Bowers-Daines Margaret M.
Lange Barry C.
Bowers-Daines Margaret M.
Gowling Lafleur Henderson Llp
Lange Barry C.
Rohm And Haas Company
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