C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/177.5, 260/5
C07C 49/76 (2006.01) C07C 45/46 (2006.01) C08G 61/12 (2006.01) C08G 67/00 (2006.01) C08G 75/20 (2006.01)
Patent
CA 1271771
Abstract Aromatic oligomers, in particular arylene ketone and arylene sulfone oligomers, are prepared by reacting an appropriate monomer system in the presence of free Lewis acid and a complex between a Lewis acid, for example, alumi- num trichloride, and a Lewis base, for example, N,N-dimethylformamide, and, optionally, a diluent, such as methylene chloride. The process is particularly advan- tageous for the preparation of substantially or all para- linked arylene ether ketone oligomers as the presence of the Lewis acid/Lewis base complex markedly reduces alkylation and ensures the substantial absence of ortho substitution. The monomer system can be, for example, a self-reacting monomer such as p-phenoxy-benzoyl chloride or a two-monomer system such as 1,4-diphenoxybenzene and terephthaloyl chloride.
492719
Gors Heinrich Carl
Jansons Viktors
Fetherstonhaugh & Co.
Raychem Corporation
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