Preparation of carbonyl fluoride

Details Preparation of carbonyl fluoride Preparation of carbonyl fluoride

C - Chemistry, Metallurgy

01

B

C01B 31/28 (2006.01)

Patent

CA 2557973

Carbonyl fluoride which can be used as an etching gas, produced by photochemical oxidation of chlorodifluoromethane or trifluoromethane with light, preferably light having a wavelength of >= 280 nm in the presence of chlorine.

L'invention concerne un procédé de production de fluorure de carbonyle, qui peut aussi être utilisé en tant que gaz d'attaque, par oxydation photochimique de chlorodifluorométhane ou de trifluorométhane, au moyen de lumière, par exemple à l'aide de lumière dont la longueur d'onde est = 280 nm, en présence de chlore.

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