Preparation of high purity boron

C - Chemistry – Metallurgy – 01 – B

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23/301, 148/3.8

C01B 35/02 (2006.01) C30B 15/04 (2006.01)

Patent

CA 1311906

PREPARATION OF HIGH PURITY BORON ABSTRACT OF THE DISCLOSURE Boron particles in bead-like form suitable for use in the preparation of doped, single crystal silicon can be prepared using a fluidized bed technique for chemical vapor deposition of a boron hydride, such as diborane or decaborane.

612126

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