C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/237, 260/305
C07D 233/56 (2006.01) A61K 31/415 (2006.01) C07D 233/54 (2006.01) C07D 405/04 (2006.01)
Patent
CA 1266669
ABSTRACT OF THE DISCLOSURE Processes are provided herein for the preparation of novel compounds of the Formula Image (I) wherein X is -CH2-, -CH2CH2- or -O-; R1 is H, lower alkyl having 1 to 4 carbon atoms, lower alkenyl having 2-4 carbon atoms, OCH3 or OCH2CH3; R2 is H, CH3, CH2CH3, OCH3 or OH; R3 is H, CH3, CH2CH3, OCH3 or Hal; R4 is H, CH3, CH2CH3, OCH3 or Hal; and Hal is halogen; or their non-toxic, pharmaceutically-acceptable, acid-addition salts, or mixtures thereof. Such compounds and their salts as above identified exhibit valuable pharmacological activity and are useful, especially as selective .alpha.2 receptor antagonists.
495608
Karjalainen Arja Leena
Karjalainen Arto Johannes
Kurkela Kauko Oiva Antero
Virtanen Raimo Einari
Borden Ladner Gervais Llp
Farmos-Yhtyma Oy
Karjalainen Arja Leena
Karjalainen Arto Johannes
Kurkela Kauko Oiva Antero
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