C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/118.5
C07D 499/04 (2006.01) C07D 499/00 (2006.01) C07D 499/58 (2006.01) C07D 499/78 (2006.01)
Patent
CA 1036593
A B S T R A C T The invention relates to compounds of the formula: Image wherein R stands for benzyl, phenoxymethyl, 4-amino-4-carboxy-1-butyl, R3O-, R3S-, R3R4N- wherein R3 is loweralkyl, aryl or arylloweralkyl, R4 is hydrogen or R3, and R2 is hydrogen or methoxy, and R1 is hydrogen or a cleavable radical such as -CH2OCH3, loweralkyl, 2,2,2-trichloroethyl, benzyl, p-nitrobenzyl, benzhydryl, phenacyl or trimethyl- silyl. The novel compounds are useful intermediates in the preparation of known penicillin and cephalosporin derivatives.
209225
Chin Clinton G.
Micetich Ronald G.
Morin Robert B.
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