Pressure sensitive correction composition and method of use

C - Chemistry – Metallurgy – 09 – J

Patent

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400/1709, 400/17

C09J 7/02 (2006.01) B41J 29/373 (2006.01) C08L 57/04 (2006.01)

Patent

CA 1128242

Abstract Low tack pressure sensitive compositions containing a paraffinic wax and/or polyethylene resin, a tackifier, an isobutylene polymer, and a copolymer of ethylene and/or propylene and a monoethylenically unsaturated ester: and use thereof to remove erroneously typed images from a substrate.

363335

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