Pressure tight vacuum chamber of electron beam engraving...

B - Operations – Transporting – 23 – K

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327/5

B23K 15/00 (2006.01) B01J 3/00 (2006.01) B23K 15/06 (2006.01) B41C 1/02 (2006.01) B41C 1/05 (2006.01)

Patent

CA 1259667

ABSTRACT OF THE DISCLOSURE A pressure-tight vacuum chamber for an electron beam engraving machine for accepting printing cylinders during engraving in the engraving machine, characterized by a vacuum hood being secured on a lower part in a vacuum- tight manner and having a loading in the upper part closed by a cover and an arrangement for lifting the cover from the opening and moving it along the outer circumference of the hood to an open position to allow removing and loading printing cylinders and forms into the engraving machine. The arrangement for lifting and conveying preferably includes a pair of arcuate rail segments at each end of the loading opening with one of the segments being pivotally mounted to move from a lower position with the cover in the closed position to an upper position to form a conveying path which lifts the cover out of the opening and allows the cover to be conveyed to the open position.

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