Process and an apparatus for producing a thin photoimageable...

Details Process and an apparatus for producing a thin photoimageable... Process and an apparatus for producing a thin photoimageable...

G - Physics

03

F

G03F 7/16 (2006.01) B05C 5/00 (2006.01) G03F 7/027 (2006.01) H05K 3/00 (2006.01) H05K 3/22 (2006.01)

Patent

CA 2065897

A process for producing thin photoresists on printed circuit boards wherein a metallic-layered substrate is conveyed beneath a free falling curtain of a photopolymerizable substance, said substance having a viscosity of 30-120 seconds DIN cup 4 at 25°C, corresponding to 104-608 mPas, and being applied at a curtain height of 5 - 25 cm above the board to form a coating having a dry film thickness less than or equal 25 µm after the coated surfaces are dried, whereupon the surfaces are available for photoimaging, developing, etching and stripping operations. The apparatus for producing such thin photoimageable coatings on metallic-layered substrates comprises vacuum means to maintain the boards on the conveyance means in a flat fixed position as they pass beneath the curtain. According to another aspect of the invention the apparatus also comprises a cooling means for cooling the boards from underneath while their upper side is being dryed subsequent to coating in the coating station.

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