G - Physics – 05 – D
Patent
G - Physics
05
D
G05D 11/02 (2006.01) F17C 7/04 (2006.01) F17C 13/02 (2006.01) G05D 16/00 (2006.01)
Patent
CA 2237139
The invention is directed to a process for providing a gas having a minimum pressure and a composition that includes a major component to an end application, said process comprising the following steps: a) providing a first gas having said major component in a first concentration to said end application; b) providing means for measuring the pressure of said first gas being delivered to said end application; c) providing a second gas having a second concentration of said major component of said first gas which exceeds said first concentration; d) providing a third gas having a third concentration of said major component of said first gas which is less than said first concentration; e) providing means for mixing said second and said third gases so as to produce a fourth gas at at least said minimum pressure and which has said major component in a fourth concentration; wherein, f) when said means for measuring the pressure of said first gas to be received at said end application detects a deficiency with respect to said minimum pressure, said deficiency is offset by the addition of said fourth gas.
Cette invention concerne un procédé d'alimentation d'appareils utilisateurs en gaz renfermant un composant principal, sous une pression minimale, comportant les étapes suivantes : a) amener audit appareil utilisateur un premier gaz renfermant une première concentration dudit composant principal; b) prévoir un dispositif de mesure de la pression d'admission dudit premier gaz audit appareil utilisateur; c) prévoir un deuxième gaz renfermant ledit composant principal à une concentration supérieure à celle de ce même composant dans le premier gaz; d) prévoir un troisième gaz renfermant ledit composant principal à une concentration inférieure à celle de ce même composant dans le premier gaz; e) prévoir un dispositif de mélange desdits deuxième et troisième gaz pour fournir, sous au moins ladite pression minimale, un quatrième gaz renfermant ledit composant principal à une quatrième concentration; de sorte que f) lorsque la pression d'admission dudit premier gaz audit appareil utilisateur, mesurée par ledit dispositif de mesure de pression, est inférieure à ladite pression minimale de consigne, l'écart est compensé par admission dudit quatrième gaz.
Couwels Ludo Corneel
Steigman Frederic Neal
Praxair Technology Inc.
Sim & Mcburney
LandOfFree
Process and apparatus for backing-up or supplementing a gas... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process and apparatus for backing-up or supplementing a gas..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process and apparatus for backing-up or supplementing a gas... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1381947