Process and apparatus for preparing finely-divided silicon...

Details Process and apparatus for preparing finely-divided silicon... Process and apparatus for preparing finely-divided silicon...

C - Chemistry, Metallurgy

01

B

23/193, 23/389

C01B 33/18 (2006.01) B01J 12/00 (2006.01) C01B 7/19 (2006.01)

Patent

CA 1175638

ABSTRACT OF THE DISCLOSURE Process and apparatus are provided for preparing finely- divided silicon dioxide in good yield by reaction of silicon fluoride in the vapor phase with water vapor, combustible gas and free oxygen-containing gas in a flame reaction zone to form hydrogen fluoride and silicon dioxide entrained in a gaseous reaction mixture; withdrawing the gaseous reaction mixture from the flame reaction zone; and then immediately and rapidly cooling the gaseous reaction mixture and entrained silicon dioxide to a temperature below 700°C by passing the gaseous reaction mixture in a turbulent flow at a Reynolds number above 300 under constraint through a straight narrow passage in alignment with the gas flow, the passage having a diameter within the range from about 20 to about 150mm and smooth walls constituting a cooling surface.

391731

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