Process and apparatus for supporting crystalline wafers

Details Process and apparatus for supporting crystalline wafers Process and apparatus for supporting crystalline wafers

H - Electricity

01

L

269/1, 356/191

H01L 21/68 (2006.01) B23B 23/02 (2006.01) B28D 5/00 (2006.01) B65G 47/91 (2006.01) H01L 21/683 (2006.01)

Patent

CA 1177584

ABSTRACT The invention relates to a process and apparatus for supporting crystalline wafers utilizing the suction effect of flowing gas on the crystalline wafers. An almost point- like support of the crystalline wafer is achieved. Further- more, the invention relates to a holding tool for carrying out the process, which tool has at the center of the holding face, a point-like projection. -11-

386520

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