Process and apparatus for the formation of negative resist...

Details Process and apparatus for the formation of negative resist... Process and apparatus for the formation of negative resist...

G - Physics

03

F

96/220

G03F 7/022 (2006.01) G03F 7/20 (2006.01) G03F 7/26 (2006.01) G03F 7/30 (2006.01) G03F 7/38 (2006.01)

Patent

CA 2001852

ABSTRACT A negative resist pattern is formed using a resist containing a diazoquinone sensitizer. An imagewise ex- posed area of a layer of the resist is subjected to heat treatment with a water-containing heating medium in the presence of a carboxyl-inactivating agent. The entire surface of the layer is exposed to radiation. The thus- exposed surface is then treated with an alkaline devel- oper solution. An apparatus suitable for use in the practice of the above process is also disclosed.

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