C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
C23C 14/30 (2006.01) H01J 37/305 (2006.01)
Patent
CA 2194742
In a process for coating a substrate surface with a layer of inorganic material (38), the inorganic material is vaporised in a vacuum chamber evacuated to at least 10-3 mbar by bombarding with an electron beam from a high voltage electron-beam gun (10) and deposited on the substrate surface. Gas discharging is created between the point of incidence (A) of the electron beam (16) on the inorganic material (38) to be vaporised and an anode (20) such that the electrostatic charge created by the high voltage electron-beam gun (10) flows off via the anode (20). This way damage to the substrate, which may arise as a result discharging phenomena, can be effectively avoided.
Procédé pour revêtir un substrat d'une couche de matériau inorganique (38), lequel est vaporisé dans une chambre à vide sous au moins 10-3 mbar par bombardement au moyen d'un faisceau d'électrons provenant d'un canon électronique à haute tension (10) et déposé sur le substrat. Une décharge gazeuse se produit entre le point d'incidence (A) du faisceau d'électrons (16) sur le matériau inorganique (38) à vaporiser et une anode (20) de façon que la charge électrostatique créée par le canon électronique (10) soit libérée par l'anode (20). On peut ainsi éviter efficacement les dommages que peut causer au substrat le phénomène de décharge.
Lohwasser Wolfgang
Wisard Andre
Alusuisse Technology & Management Ltd.
Norton Rose Or S.e.n.c.r.l. S.r.l./llp
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