Process and device for forming a resist pattern on a...

Details Process and device for forming a resist pattern on a... Process and device for forming a resist pattern on a...

B - Operations, Transporting

23

K

327/1.4

B23K 26/00 (2006.01) B41C 1/05 (2006.01) B41C 1/14 (2006.01) G03F 7/24 (2006.01)

Patent

CA 2003949

- 1 - ABSTRACT Process and device for forming a resist pattern on a cylindrical object, and an etched metal cylinder obtained using such a resist pattern. Described are a process and device for forming a resist pattern on both the inner side and the outer side of a cylindrical object (20) with use of one or more laser beams. In the device the cylindrical object (20) is arranged such that it may be rotatably driven while free access is left for the laser equipment to process the material layer on the inner and outer surfaces of the cylindrical object (20). Preferably use is made of one single laser (12) of which the beam is split using a beam splitter (13). Also is claimed an etched metal cylinder which is obtained by etching a metal cylinder (20) using an etching resistance pattern on the inside and outside and formed with use of the claimed process.

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