C - Chemistry – Metallurgy – 02 – F
Patent
C - Chemistry, Metallurgy
02
F
C02F 11/12 (2006.01) A61L 2/12 (2006.01) A61L 11/00 (2006.01) C02F 1/30 (2006.01) H05B 6/80 (2006.01)
Patent
CA 2216374
In a process and a device for treating screen from the mechanical cleaning stage of a sewage treatment plant, electromagnetic waves in the frequency range from 1 GHz to 1 THz (microwaves) are applied to the screen for a predeterminable period.
L'invention concerne un procédé et un dispositif permettant de traiter les matières retenues provenant d'un étage d'épuration mécanique d'une installation de décantation d'eaux résiduaires. Ce procédé se caractérise en ce que les matières retenues sont soumises à l'action d'ondes électromagnétiques comprises dans la gamme de fréquences allant de 1 GHz (gigahertz) à 1 THz (terahertz), ou micro-ondes, pendant une durée prédéterminable.
Egner Andrea
Egner Umwelttechnologie Gmbh
Kirby Eades Gale Baker
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