Process and device for uprating the utilization rate of gas...

Details Process and device for uprating the utilization rate of gas... Process and device for uprating the utilization rate of gas...

C - Chemistry, Metallurgy

02

F

362/25

C02F 3/22 (2006.01) B01F 3/04 (2006.01) B01F 5/04 (2006.01) B01F 5/10 (2006.01) C02F 3/12 (2006.01)

Patent

CA 1191287

ABSTRACT OF THE DISCLOSURE: Process and device for increasing the rate of solu- tion of gas in a liquid. A mixture of a liquid and gaseous component is fed into a covered channel for secondary mixing, said secondary mixing channel being disposed in an elongated circulation oxidation ditch. The energy of the mixture flow- ing out of the secondary mixing channel impels the liquid in the channel in the direction of the longitudinal axis of such channel, and increases the rate of solution of the gas in such liquid. At the same time, the gas-liquid discharge ratio is decreased while the rate of liquid component discharge is increased.

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