G - Physics
05
B
341/110, 354/230
G05B 13/02 (2006.01) G05B 11/42 (2006.01) G05B 15/02 (2006.01) G05D 23/20 (2006.01)
Patent
CA 1155527
PROCESS CONTROL Abstract of the Disclosure A process control system is provided in which a process variable is compared to a set point for the process variable by a process controller with the results of the comparison being utilized to control the process in such a manner that the process variable will be substantially equal to the set point for the process variable. A critically damped response of the process variable to a change in the set point is achieved by utilizing a process controller which has the characteristics of a proportional-integral-derivative controller followed by a first order lag. Tuning of the process controller is accomplished by changing a time constant which is common to the proportional, integral and derivative terms of the proportional-integral-derivative controller and also common to the first order lag.
372680
Osler Hoskin & Harcourt Llp
Phillips Petroleum Company
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