Process control circuit for metal-depositing baths

Details Process control circuit for metal-depositing baths Process control circuit for metal-depositing baths

G - Physics

05

D

341/1.1

G05D 21/02 (2006.01) C25D 21/12 (2006.01)

Patent

CA 1082337

Abstract of the Disclosure A process control circuit which is adapted for the control and monitoring of a plurality of parameters in one or more metal-depositing baths, has parameter control circuit blocks for each of the parameters to be measured. Each of the parameter control circuit blocks has a measuring stage for producing a measured value corresponding to one of the parameters, a calibration stage for calibrating the measuring stage, a comparison stage for comparing the measured value to a stored nominal value, and a dosing circuit which is connected to the comparator and which doses the metal- depositing bath in response to a comparison signal from the comparator.

253935

Affiliated with

Also associated with

Rating

Process control circuit for metal-depositing baths does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process control circuit for metal-depositing baths, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process control circuit for metal-depositing baths will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-779680