Process control system

G - Physics – 05 – B

Patent

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Details

G05B 11/38 (2006.01) G05B 11/42 (2006.01) G05D 16/20 (2006.01)

Patent

CA 2184423

A process control system according to the present invention uses analog control circuitry in which a differential amplifier stage is incorporated into the feedback path rather that the feedforward path to enable the control of highly non-linear processes that may also exhibit high levels of hysteresis. Such processes often have superior performance characteristics that conventional control circuitry cannot exploit. The present invention additionally incorporates an automatic control circuit which varies the gain of various stages the control circuitry when the output of the process is within a predetermined range. An embodiment of the present invention is used to control anonlinear proportional valve with severe hysteresis. The valve regulates the pressure within pressure-driven ophthalmic surgical instruments, which must be controlledextremely precisely to enable successful eye surgery.

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